Optics Balzers offers patterning solutions for high quality optical components. Depending on the product and its applications, various patterning techniques are available to meet a broad range of customer requirements for feature sizes and shapes.
Patterning
Photolithography (Wet etching, Reactive ion etching, Lift-off)
Photolithography capabilities such as etching and lift-off techniques allow the production of precision patterned coatings and submicron gratings. The photolithography techniques are specifically used in producing masked cover lids for MEMS devices and CCD/CMOS image sensors.
Laser Ablation
Laser ablation offers novel opportunities in patterning of optical filter coatings. By using adapted processes for each specific application, high precision patterns can be produced on the coated components. Laser ablation offers excellent flexibility for customized shapes and patterns together with high speed processing capabilities.
Masked Coatings
Precision etched metal masks attached to the substrates provide patterned coatings during the coating process. While the achievable feature sizes and shapes are limited with direct masking, patterning can be applied with almost any coating process and coating material, also with processes that require higher temperatures.
